Thin films for electronic applications by PT&B

Aluminum Nitride          Gallium Oxide           Carbon Alloys            Metallic Films    

PT&B deposits films for electronic applications by PVD (Sputter-Deposition). Among these are the following coatings:
  • highly c-axis oriented (textured) aluminum nitride (AlN) for the use in, e. g. SAW devices
  • thin films of gallium oxide (Ga2O3) and gallium nitride (GaN) at substrate temperatures as low as 500 K
  • doped carbon coatings, which are useful for example as electronically conductive diffusion barriers
  • metallic films of, e. g. Al, Ti, Mo, Ag, Au, W

For the case of interest please send a request to PT&B!